Nanometrology Group

The group is dedicated to the non-contact, non-destructive examination of material surfaces using a wide range of techniques including AFM (atomic force microscopy), SEM (scanning electron microscopy) and interferometry. These methods allow detailed analysis of surface topography, which is crucial for understanding the structure and properties of materials at the microscopic level.

The main goals of our group are to obtain accurate topography, local spectroscopy and fluorescence of semiconductor surfaces, which are critical for the development and optimization of electronic devices. Our work in this area includes detailed studies of surface properties and their impact on the performance and reliability of semiconductor devices.

In addition, our group is also working on optical methods and their applications in industrial environments. This includes the development and implementation of new optical techniques for quality control and materials diagnostics that can be used directly in industrial processes. Our technologies enable fast and accurate analysis of materials, which is key to ensuring high quality production and minimizing defects.